Are there any surface modification techniques for tungsten targets?

Yes, there are several surface modification techniques for tungsten targets. One technique is to deposit a low surface energy coating on the surface of the tungsten target. This can be achieved through methods such as plasma enhanced chemical vapor deposition (PECVD) or physical vapor deposition (PVD).
The low surface energy coating can reduce the surface energy of the tungsten target, which can help reduce material adhesion and prevent material buildup during plasma processing. Another technique is to texturize the surface of the tungsten target, which can be achieved through methods such as laser ablation or shot peening.
Texturizing can form a rough surface that enhances the wettability of the surface by reducing the contact area between the target surface and the material, thereby minimizing material adhesion. These surface modification techniques can improve the performance and service life of tungsten targets in plasma material processing technologies.