ZhenAn Zr Sputtering Targets Factory
Zhenan has more than 30 years of experience in the production of zirconium sputtering targets and can provide you with one-to-one exclusive service. If you are interested in the product, you may wish to contact us to inquire about the relevant price.
High Purity Zirconium Sputtering Target
Zirconium (Zr) sputtering targets are used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Our factory specializes in producing high-density and lowest-priced high-purity zirconium (Zr) sputtering targets.
Specifications Of High Quality Zirconium Targets
|
Product Name |
Zirconium target |
|
Available Purity |
99.95%min, as you request |
|
Available shape |
round, rectangular, pellets |
|
Density |
6.508/cm3 |
|
Melting point |
1852℃ |
|
Technology |
Melting |
Advantages Of Zirconium Targets In Our Factory
- Smooth surface, no pores, scratches and other defects
- Grinding or turning edges without cutting marks
Our Service
- Professional manufacturer--15 years of experience
- Strict quality control - SGS inspection
- High supply capacity--3000MT/month
- Prompt delivery - within 15 days
Zhenan has a professional transportation team to ensure the safety of the cargo transportation environment. To order products, please contact:info@zaferroalloy.com.