Precautions for raw materials before tantalum target processing
Purity requirements: The purity of tantalum targets is critical to their performance, and the purity is usually required to reach 99.95% (3N5), 99.99% (4N) or 99.995% (4N5). High-purity tantalum targets can reduce the impact of impurities on the performance of sputtered films.
Impurity control: In addition to purity requirements, the content of individual impurities needs to be strictly controlled to meet the specific needs of users. Impurities such as oxygen, nitrogen, carbon, etc. not only affect the conductivity and corrosion resistance of the target, but may also cause film defects during film deposition.
Zhenan High Purity Tantalum Target Product Detail Parameter Table
| Name | Metal Tantalum Ta magnetron sputtering target |
| Purity | 99.9%-99.995% |
| Size | 372x74x6mm, D3x3mm,D6x6mm,D50.8x3mm, 2inch,3inch, As request |
| Boiling Point | 54257 |
| Density | 16.654g/cm³ |
| Melting Point | 2996.0 |
| Shape | Planar target, Rotary target,Arc Cathode. |
| MOQ | 1PCS |
Zhenan round tantalum target product sample display picture
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FAQ About ZhenAn
Q1: Can I get samples for testing?
A: Yes! The test can visually show the application results. In fact, the samples are free,
You only need to pay the courier fee.
Q2: Can I use our own packaging?
A: Yes! We can provide OEM. You can send the packaging materials to our factory
Or we can buy the specified packaging for you.
If this is the case, you may need to pay some additional fees.
Q3: Do you have an inspection procedure for evaporation materials?
A: 100% self-inspection before packaging
Q4: What do I consider when I choose an evaporation material?
A: The application and application effect you want.