High Density Ta Target

High Density Ta Target

Dimensions: as per drawing or sample
Standard: ASTM B 708/365
Processing method: CNC machining
Surface condition: ground or polished
Application: for semiconductor and optical coating industries
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Description
Technical Parameters
Welding and machining of Zhenan tantalum targets

 

Welding quality: The welding quality between the tantalum target and the backing plate has an important impact on the overall performance and service life of the target. Brazing or diffusion welding is usually used for welding, and parameters such as welding temperature, time and pressure need to be strictly controlled during the welding process.
Machining accuracy: The target needs to be precisely machined to achieve the required size and shape. The machining accuracy needs to be controlled below 0.1mm to ensure the surface flatness, surface quality and sputtering performance of the target.
Prevent deformation: For targets with larger sizes, deformation and other problems are prone to occur during machining. Therefore, appropriate measures need to be taken during the machining process, such as the use of large-scale machining lathes or machining center equipment, as well as reasonable fixtures and process parameters, to reduce deformation and improve machining accuracy.

 

Zhenan High Purity Tantalum Target Product Detail Parameter Table

 

Name

Symbol

Purity

Status

Normal Size

Tantalum

Ta

3N/3N5/4N/4N5/5N

Multi-Arc Target

Diameter<1000mm;Thickness>1mm

3N/3N5/4N/4N5/5N

Rectangular target

Length, width and thickness are not limited,
rectangular/sheet/stepped (the length can be combined catch)

4N/4N5

Pellets

φ 3*3mm, φ 6*6mm, 3-10mm (minimum order 100g)
more sizes can be customized

2N8

Powder

φ 3*3mm, φ 6*6mm, 3-10mm (minimum order 100g)
more sizes can be customized

3N/3N5

NiV7

Size can be customized as required

3N/3N5/4N

NiCr

Size can be customized as required

 

Zhenan round tantalum target product sample display picture
High Purity ta Sputtering Target
Pure ta metal sputtering target
High Purity Tantalum Sputtering Target
Pure Tantalum metal sputtering target
Why choose us

 

1. Free samples

2. Rich market forecast suggestions

3. Timely response, quick feedback on customer needs

4. Lock the price to help you save costs trade guarantee

5. Advanced production line, strong production capacity

6. Professional order system, complete operation

 

FAQ About ZhenAn

 

Q: Is the price negotiable?

A: Of course, if you have any questions or want to expand the market, please feel free to contact us, we are committed to providing the best support.

Q: Can you provide free samples?

A: Yes, we are happy to provide free samples. For more details on sample requests, please feel free to contact us.

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