Preparation process and method of Zhenan tantalum target
Smelting and casting: Tantalum target is usually prepared by vacuum electron beam furnace melting to obtain high-purity tantalum ingot. The melting temperature and atmosphere need to be strictly controlled during the melting process to avoid oxidation and contamination.
Plastic processing: The tantalum ingot obtained by melting needs to undergo plastic processing such as rolling and annealing to regulate the microstructure and the shape and size of the billet. These processes can refine the grains and improve the uniformity and mechanical properties of the target.
Powder metallurgy: In some special cases, such as the preparation of tantalum aluminum alloy target or tantalum silicon alloy target, due to the difference in melting point or the low toughness of the compound, the melting and casting method cannot be used, and the powder metallurgy method must be used. Powder metallurgy can ensure the uniform mixing of raw materials and reduce the segregation phenomenon in the microstructure.
Zhenan High Purity Tantalum Target Product Detail Parameter Table
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Composition |
Tantalum Sputtering Target Materials |
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Purity |
4N-5N-6N Please contact seller |
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Density (g/cm³) |
Please contact seller |
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resistivity(Ω·cm) |
-- |
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Dimension (mm) |
customized. |
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Zhenan round tantalum target product sample display picture


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If the Gross Weight ≥ 100kg ,you can choose by Air or Sea to the nearest port.
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