Related introduction of tantalum sputtering target
Tantalum sputtering target is a tantalum sheet obtained by pressure processing, with high chemical purity, small grain size, good recrystallization structure and consistency in three axes. It is mainly used for sputtering deposition coating of optical fibers, semiconductor chips and integrated circuits. Tantalum target can be used for cathode sputtering coating, high vacuum absorption active materials, etc. It is an important material for thin film technology.
Related parameters of tantalum targets
| Material | Tantalum Alloy Materials |
| Purity | 99.9%-99.999%, 3N,3N5,4N,5N etc |
| Size | D50.8x3mm,1-10mm, D3x3mm, 2inch,3inch,Or As Request |
| Color | White Color |
| Shape | Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request. |
| Surface | Polished Surface |
| Ta Density | 16.65g/cm3 |
| Ta Melting Point | 2996°C |
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A: After confirming the order and receiving the advance payment, it can be shipped within 5-30 days. If it is a special customized product, the delivery time needs to be communicated.
Q: Can you accept customized production?
A: Yes, we accept customized production, both ODM and OEM are OK.
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