High Purity Molybdenumn Sputtering Target

High Purity Molybdenumn Sputtering Target

Model: Molybdenum sputtering target
Name: Molybdenum sputtering target
Purity: Mo≥99.95%
Density: ≥10.22 g/cm3
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Description
Technical Parameters
Detailed introduction of molybdenum target

 

Molybdenum target is a high-quality metal material used in sputtering coating process. Due to the high melting point and thermal stability of molybdenum, molybdenum target performs well in high-temperature sputtering process, has excellent performance and a wide range of uses. Our molybdenum target has high chemical purity to ensure high quality and reliability in the film deposition process; it also has a uniform microstructure, which helps to produce uniform and stable films. Molybdenum targets are widely used in semiconductor manufacturing for the preparation of conductive layers, optical films and other functional films. In the field of optics, molybdenum targets can also be used to prepare high-reflectivity lenses, optical coatings and other optical components.

 

We are your best and most assured choice

 

1. Professional and timely pre-sales consulting team

2. One-to-one sales support team

3. Professional manufacturing team

4. Butler-style after-sales service team

 

Various parameters of molybdenum target

 

Name Metal Molybdenum Round Sputtering Targets (Mo Target)
Material Molybdenum Metal Materials
Purity 99.9%-99.95%, 3N,3N5
Size 10x10x10mm,1-10mm, D3x3mm, 2inch,3inch,Or As Request
Color Metallic Color

 

Company environment and customer visits

pure moly sputtering target company

pure Molybdenum sputtering target company

We look forward to working with you. If you have any questions or needs regarding our products and services, please feel free to contact us.

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