Moly Metal Sputtering Target

High purity, high density, grain size, crystal orientation, thermal conductivity and electrical conductivity

(1) The higher the purity of the molybdenum target, the better the performance of the sputtered film. Generally, the purity of molybdenum sputtering target must be at least 99.95%.

(2) During the sputtering coating process, when the sputtering target with low density is bombarded, the gas in the pores inside the target is suddenly released, resulting in large-scale target particles or microparticles splashing, or after the film is formed, the film is bombarded by secondary electrons to form microparticles splashing. The appearance of these particles will reduce the quality of the film. In order to reduce the pores in the target solid and improve the performance of the film, the sputtering target is generally required to have a higher density. For molybdenum sputtering target, its relative density should be above 98%.

(3) Generally, molybdenum sputtering target is a polycrystalline structure, and the grain size can range from micrometers to millimeters. The sputtering rate of fine-scale grain targets is faster than that of coarse grains, and the thickness distribution of the deposited film is more uniform for targets with smaller grain size differences.

1. We will try our best to reply our customers' requests within 24 hours.

2. We will maintain effective and efficient communications with our customers.

3. We provide first-class quality control and after-sale services.

We can provide you with free samples, manuals, laboratory test reports, industry reports, etc. Welcome to visit our factory and company.