Processing precautions for nickel targets
1. Raw material preparation and processing
Raw material purity: Ensure that the nickel raw materials used are of high purity, generally requiring 99.9% or higher to ensure the performance and quality of the final product.
Raw material cleaning: Before processing, the nickel raw materials are thoroughly cleaned to remove surface oxides, impurities, etc. to improve the cleanliness and sputtering efficiency of the nickel target.
2. Process control
Polishing and grinding: Polish and centrifugal grind the nickel plate to further remove surface impurities and improve the cleanliness and surface flatness of the target. During polishing and grinding, it is necessary to control the intensity and time to avoid excessive processing that may lead to a decrease in target performance.
Processing environment: Keep the processing environment clean and dry to avoid the influence of pollutants such as dust and moisture on the nickel target. At the same time, control the temperature and humidity of the processing environment to ensure the stability and consistency of the processing process.
3. Quality control and testing
Size and shape: The size and shape of the nickel target are processed according to customer requirements or design drawings to ensure that they meet the use requirements. Multiple size and shape tests are required during the processing process to ensure the accuracy and consistency of the product. Performance testing: The performance of the processed nickel target is tested, including density, hardness, toughness, corrosion resistance, etc., to ensure that the product meets the relevant standards and requirements.
Nickel target product detailed parameter table
|
Content |
99.99% |
|
Dimension |
As per your request |
|
Available shape |
circular, rectangular |
|
Shape (Max or Minimum) |
customized |
Nickel Sputtering Target Product Display
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