Introduction to various related parameters of niobium targets
Grade: RO4200, R04210, Nb1, Nb-Ti
Origin: Baoji Niobium content>: 99.95(%)
Impurity content: 0.0001(%)
Purity: 99.95%-99.99%
Grade: R04200, R04210, Nb1, Nb-Ti
Standard: ASTM B393-05
Specification Manufacturing process: Magnetron sputtering principle
Application areas: microelectronics, silicon wafer manufacturing, flat panel displays, storage technology.
Process: hot rolling, cold rolling, alkali washing, shearing.
Construction period: delivery within 20 days after customization
Payment method: 30% deposit, 70% paid before shipment
Packing method: packed in wooden boxes with plastic partitions, with material certificates and packing lists and other accessories, the weight of a single box does not exceed 100kg
Specifications of niobium targets
| Product: | niobium sputtering target |
| Purity: | 3N5 |
| Size: | customized |
| Shape: | circular, rectangular |
| Technology: | powder metallurgy |
| Application: | PVD coating industry |
| Packing: | vacuum package, export carton or wooden case outside |
| Related products: | NbTi, NbN, CuNb, NbMo, NbC, LiNbO3 and etc. |
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