Introduction to the selection and purity classification of niobium target raw materials
Purity requirements:
Semiconductor grade: ≥99.995% (4N5), total impurities (Fe, O, N) <50 ppm.
Superconducting grade: ≥99.999% (5N), grain boundary defect density <10⁶ cm⁻².
Grain size control: Refine the grains to ≤50 μm through directional solidification or HIP technology to improve the sputtering uniformity of niobium targets.
Niobium target product details parameter table
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Model Number
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niobium targets
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Application
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evaporation coating
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Shape
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Rectangular, round
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Material
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Nb>99.9%, 99.95%, 99.99%, 99.995%
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Chemical Composition
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Nb
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Niobium target product details picture display


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