Zirconium target material preparation process
The preparation process of zirconium target material mainly includes raw material preparation, target blank preparation, sintering, processing into target material and surface treatment.
Raw material preparation:
The main raw material is pure zirconium powder or zirconium alloy powder. Common zirconium alloys include zirconium-hafnium alloy, zirconium-niobium alloy, etc. These alloys have better thermal stability and mechanical properties.
Target blank preparation:
If alloy powder is used, it is necessary to mix zirconium powder and alloy powder in different proportions evenly, usually using a ball mill or a vibrating mixer for mixing.
The evenly mixed powder is pressed into a blank by a pressing machine. Commonly used forming methods include cold isostatic pressing and hot isostatic pressing.
Sintering:
The pressed blank is sintered at high temperature, usually by hot isostatic pressing. The sintering temperature and time need to be adjusted according to the specific material and process requirements, usually above 1500°C. During the sintering process, it is necessary to control the atmosphere to avoid oxidation and contamination.
Processing into target material:
The sintered blank is processed into the desired target shape, such as a disc, by mechanical processing methods such as turning, milling, and grinding. Use high-precision processing equipment to ensure the dimensional accuracy and surface quality of the target material.
Surface treatment:
The processed target material is subjected to surface treatment such as polishing or chemical polishing to improve the surface finish and uniformity. Use methods such as ultrasonic cleaning and chemical cleaning to remove impurities on the surface.
Basic parameter standards of zirconium targets
| Product Name | Zirconium (Zr) Sputtering Target |
| Purity | 99.5%~99.95% |
| Shape | Discs, Plates, Column Targets, Tubing Targets, Custom-made |
| Dimensions | Round sputtering target: Diameter: <18", Thickness: >0.04" Rectangular sputtering target: Length: <36", Width: <12", Thickness: >0.04" |
| Bonding | Indium |
Zhenan zirconium target product details picture display
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