Introduction and process flow of zirconium target
Zirconium (Zr) sputtering target has the same properties as its raw material. Its density is 6.49g/cc, melting point is 1852℃, and vapor pressure is 10-4 Torr at 1987℃.
Zirconium sputtering target is widely used in decorative coating, semiconductor and optical coating fields.
Zirconium target preparation process
Material preparation - Electron beam melting - Chemical analysis - Forging - Rolling - Annealing - Metallographic inspection - Machining - Dimensional inspection - Cleaning - Final inspection - Packaging
Application of zirconium sputtering targets
Widely used in thin film deposition, fuel cells, decoration, semiconductors, displays, LEDs and photovoltaic devices, functional coatings and other optical information storage space industries, glass coating industries such as automotive glass and architectural glass, optical communications and other fields.
Our advantages
1. Competitive prices.
2. Our advantages are superior to other suppliers.
3. Same price, reliable quality.
4. Timely delivery according to your requirements.
5. Professional service, greatly reducing procurement costs.
Relevant parameters of zirconium targets
|
Item: |
Zr (Zirconium) |
|
Density |
6.49g/cm3 |
|
Melting point |
1852℃ |
|
Boiling point |
4377℃ |
|
Color |
Light grey |
Company environment and customer visits
The company relies on sophisticated technology, professional equipment and a group of technicians in the rare metal industry for many years, with excellent products and satisfactory services. After years of unremitting efforts, the company's products have been sold well at home and abroad in South Korea, Japan, Germany, Russia and other countries, and are well received by users. They are listed in the ranks of high-quality suppliers. I believe that our products and services will definitely be recognized and satisfied by you!