HIP Processing Process of Tantalum Target
Hot Isostatic Pressing (HIP) Process
Loading: Loading tantalum powder or preformed blanks into high temperature and high pressure equipment.
Heating and Pressurizing: Treating the material under high temperature and isostatic pressure to densify it.
Cooling and Removing: After cooling, remove the densified tantalum target for subsequent processing.
Zhenan High Purity Tantalum Target Product Detail Parameter Table
| Surface | Polished Surface |
| Density | 16.65g/cm3 |
| Melting Point | 2996°C |
| Application | PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc |
| Related Item | Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets |
Zhenan round tantalum target product sample display picture
Our Advantages:
1.First-class technology and the rigorous work attitude
2.Professional teams to solve all kinds of problems you have during manufacturing process
3.Low purchasing cost for repetitive orders
4.Excellent customer service
FAQ About ZhenAn
1. Can you keep the unit price unchanged from last time?
The price of our products will fluctuate according to the price of raw materials, and may rise or fall. Even if the fluctuation is large, we will try our best to keep the best price for you.
2. What products do you mainly supply?
We mainly supply tungsten, molybdenum, zirconium, tantalum, niobium and their alloy products.
3. What is the quality control of your company?
We have ISO 9001:2015 certification, and we must strictly inspect our products by the quality control department before shipment.
4. What services can we provide?
Accepted delivery terms: FOB, CFR, CIF, EXW, FAS, CIP, FCA, Express;
Accepted payment methods: T/T, L/C, PayPal;
5. Can you make products with my design?
Yes, we can, we provide customized services. You can send us all the details you need, and then we will provide a detailed quotation.