High Purity Planar Tantalum Target

High Purity Planar Tantalum Target

Certificate: ISO9001:2015
Packaging: Wooden Box
Surface: Smooth Surface
Sample: Accepted
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Description
Technical Parameters
Specific uses of tantalum targets

 

Tantalum targets are widely used in the following fields:

Electronics and semiconductor industries: Tantalum films are often used as barrier layer materials in integrated circuit (IC) manufacturing, especially in copper interconnect technology. Tantalum's high melting point and low resistance make it an ideal material choice.
Anti-corrosion coating: Due to its excellent corrosion resistance, tantalum is used to coat chemical equipment and metal surfaces exposed to extreme environments to extend the service life of the equipment.
Optical and optoelectronic films: Tantalum targets can be used to manufacture films with specific optical properties, which are widely used in optical devices, displays and sensors.
Medical devices: Tantalum has good biocompatibility and is suitable for coating medical implants such as bone plates and joint prostheses to reduce human rejection reactions.

 

General Parameters of Tantalum Target

 

Product: tantalum sputtering target
Purity: 3N5, 4N
Size: customized
Shape: circular, rectangular
Technology: powder metallurgy
Application: PVD coating industry
Packing: vacuum package, export carton or wooden case outside
Related products: CoTaZr, TaW, NiTa, TaN, TaB2, TaC, TaSi2 and etc.

 

Our advantages

 

1. Competitive prices

2. Strong R&D team

3. Production process control management

4. Implementation of continuous improvement covering production, sales and customer service.

 

Customer visit and company environment

 

High Purity ta Sputtering Target

High Purity Tantalum Sputtering Target

We look forward to working with you. If you have any questions or needs regarding our products and services, please feel free to contact us.

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