Planar Tantalum Sputtering Target

Planar Tantalum Sputtering Target

Dimensions: as per drawing or sample
Standard: ASTM B 708/365
Processing method: CNC machining
Surface condition: ground or polished
Application: for semiconductor and optical coating industries
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Description
Technical Parameters
Ta target material specifications and dimensions

 

Specifications: Diameter: 180.00mm
Diameter tolerance ±0.10mm
Thickness: 18.00mm
Thickness tolerance ±0.10mm


Advantages of our ta targets:
1. High-purity materials
Selected high-quality materials
2. Various specifications
Multiple specifications can be customized
3. Surface treatment
Surface polishing and grinding

 

Applications
Tantalum targets have the characteristics of high temperature resistance, corrosion resistance, good conductivity, and the ability to form barrier films. They are mainly used in various flat panel displays, optical communications, optics, TFF, semiconductor coating and other industries.

 

Ta target related components

 

Grade

3N, 3N5, 4N, with Ta 99.99%min

Grain size

ASTM 4 or finer

Surface finish

16Rms max. or Ra 0.4 ( RMS64 or better)

Flatness

0.1mm or 0.15% max

Tolerance

+/-0.010" on all dimensions

 

Zhenan product quality control

 

1. Ensure that all goods undergo strict inspection during the production process

2. All goods must be strictly inspected before packaging.

3. Each batch of goods is re-inspected before shipment.

 

Customer visit and company environment

 

ta sputtering target company

Tantalum sputtering target company

Our factory is professional and reliable, we work hard and treat customers patiently, allowing customers to truly experience a new service that is reassuring, considerate and worry-free. 

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