Rotating Tantalum Target

Tantalum targets can be divided into two types according to their shapes: round, rectangular and triangular planar targets and rotating targets.
Tantalum targets can be divided into two types according to the target blank preparation process: molten cast forging targets and powder formed targets. The target material restricts the physical and mechanical properties of the sputtered film and affects the coating quality.
Tantalum targets should mainly meet the following requirements: ① Low impurity content and high purity. The purity of the target material directly affects the composition of the film. ② Uniform internal structure. The internal structure such as grain size and texture affects the sputtering rate and film thickness distribution. ③ Uniform composition and organizational structure. Uniform target composition and organization are important guarantees for stable coating quality.

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