Application of high-purity tantalum target
Widely used in magnetron sputtering coating, permanent magnetic materials, soft magnetic materials, functional material films, etc.
High-performance tantalum sputtering materials are used for thin film coating applications, CD-ROM, decoration, flat panel displays, functional coatings, like other optical information storage space industries, glass coating industries such as automotive glass and architectural glass, optical communications, etc.
Mechanical parameters of tantalum sputtering targets
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Grade |
3N, 3N5, 4N, with Ta 99.99%min |
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Grain size |
ASTM 4 or finer |
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Surface finish |
16Rms max. or Ra 0.4 ( RMS64 or better) |
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Flatness |
0.1mm or 0.15% max |
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Tolerance |
+/-0.010" on all dimensions |
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Our advantages
1.First-class technology and the rigorous work attitude
2.Professional teams to solve all kinds of problems you have during manufacturing process
3.Low purchasing cost for repetitive orders
4.Excellent customer service
FAQ About us
Q: Are you trading company or manufacturer ?
A: We are factory.
Q: How long is your delivery time?
A: Generally it is 5-10 days if the goods are in stock. or it is 25-30 days if the goods are not in stock, it is according to quantity.
Q: Do you provide samples ? is it free or extra ?
A: Yes, we could offer the sample for free charge but do not pay the cost of freight.
Q: What is your terms of payment ?
A: Payment<=1000USD, 100% in advance. Payment>=1000USD, 30% T/T in advance ,balance before shippment.
Customer visit and company environment
We can provide you with free samples, manuals, laboratory test reports, industry reports, etc. Welcome to visit our factory and company.