Basic preparation methods of tantalum target products
Physical vapor deposition (PVD): The film or target is prepared by evaporating or sputtering tantalum metal in a high vacuum environment.
Chemical vapor deposition (CVD): Another method for preparing tantalum targets, but not as common as PVD.
Powder metallurgy: The target is prepared by pressing and sintering tantalum powder.
Electrochemical method: Tantalum targets are prepared by electrochemical processes .
Zhenan Tantalum Target Product Details Parameter Table Display
| Available Purity | 99.9%min,as you request |
| Available shape | round, rectangular,pellets |
| Size | 1''- 8''mm,As per your request |
| Technolgy | powder metallurgy |
Zhenan Tantalum Target Product Details Picture Display


Zhenan's services:
1. Customized according to your requirements and provide you with a valid quotation.
2. We have professional engineers to design solutions for you.
3. Our team will provide professional advice and assistance for your entire project.
4. Our factory welcomes on-site inspections at any time.
5. Ensure high-quality after-sales service.
FAQ About ZhenAn
Q1. Are you a trading company or manufacturer?
A: We are a professional metal material manufacturer, focusing on this field for more than 10 years.
Q2. Is there any MOQ limit for customized materials?
A: No MOQ, we provide OEM service and support samples.
Q3. How is the quality control?
A: We always prepare samples before mass production, always do final inspection before shipment, and we also accept third party to test.
Q4. When is your payment term?
A: We accept T/T in advance, Paypal, Western Union, etc.
Q5. What is the delivery time and shipping method?
A: For samples: If in stock, can be shipped after receiving payment.
For customized size: Usually 7-21 days.
We provide DHL/UPS and FedEx Express shipping options, availability will vary depending on the destination.









