High Purity Nb Sputtering Target

High Purity Nb Sputtering Target

Shape: Plate
Surface: Polished/Bright
Color: Gray
Density: >9.3--9.5g/cm3(sintered), 9.7--9.9g/cm3(HIP)
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Description
Technical Parameters
Niobium target product description

 

Product description
Niobium rotary target is made by vacuum melting or cold spraying process, and can be produced with a maximum length of 4000mm, and the thickness can be customized according to customer requirements.
Niobium flat target is made by vacuum melting process, and can be produced with a maximum length of 2500mm and a maximum width of 400mm. The size and purity can be customized according to customer requirements.

Technical category number
Purity: 99.95-99.99%
Application areas: high conductivity and other coating industries, thin film solar industry, low radiation glass industry, flat panel display industry, optical coating industry, tool and decorative coating industry.

 

Packaging and characteristics of niobium targets

 

Brand Chemical composition: PPM, not more than
Fe Si Mo W Ti Cr Ta Ni O C H N (Nb+Ta)%≥
Nb3 20 20 80 100 10 10 1000 20 250 100 15 150 99.9%
Nb2 10 10 50 50 5 5 500 10 200 50 10 100 99.95%
Nb1 5 5 10 20 1 1 100 1 100 30 10 50 99.99%

 

Zhenan quality service

 

1. Provide you with the most competitive price

2. Provide you with relevant professional product consultation

3. You can visit our factory in person

 

Visits of buyers and company environment photos

 

High Purity Niobium Sputtering Target

pure nb metal sputtering target

Our factory is professional and reliable, we work hard and treat customers patiently, allowing customers to truly experience a new service that is reassuring, considerate and worry-free.

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