High Purity Niobium Sputtering Target

High Purity Niobium Sputtering Target

Size Diameter: 5-100mm
Standard: ASTM B392
Condition: Vacuum Annealing
Melting Point: 2468 degrees Celsius
Boiling Point: 4742 degrees Celsius
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Description
Technical Parameters
Uses of niobium targets

 

As a key component of niobium and its alloy films, niobium sputtering targets are widely used in color TFT LCD tablets, optical lenses, electronic imaging, information storage, solar cells, glass coatings, and in corrosion-resistant environments such as transportation and chemical production.

In addition, niobium sputtering targets are also used in surface coatings of advanced touch screens, flat panel displays, and energy-saving glass. It has an anti-reflective effect on glass screens.

 

Packaging and characteristics of niobium targets

 

Thickness Thickness Tolerance Diameter Diameter Tolerance
First Class Second Class
3~8 ±0.1 ±0.2 50~450 ±0.2
8~14 ±0.1 ±0.2 50~450 ±0.2
≥14 ±0.1 ±0.2 50~400 ±0.2

 

Zhenan product quality control

 

1. Ensure that all goods undergo strict inspection during the production process

2. All goods must be strictly inspected before packaging.

3. Each batch of goods is re-inspected before shipment.

 

Visits of buyers and company environment photos

 

pure nb sputtering target supplier

Pure niobium sputtering target supplier

Our company's products are widely used in rare earth, magnetic materials, steel, machinery, metallurgy, glass, petrochemical, national defense research, aerospace, vacuum coating industry. We strictly test the composition and performance of the raw and auxiliary materials of each product. During the product processing, we also conduct various mechanical, spectral analysis, and non-destructive testing measurements to ensure that the product has a complete set of quality assurance systems from production and manufacturing, process testing, finished product inspection, and after-sales service, strictly guaranteeing the quality of the factory products!

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