Technical advantages of zirconium sputtering targets
1. Film quality
High purity and uniformity of zirconium thin films
Through magnetron sputtering technology, zirconium targets can produce high-purity and high-uniformity thin films.
2. Performance stability
Stable performance in high temperature and corrosive environments
Zirconium thin films perform well in high temperature and corrosive environments and can maintain stable performance for a long time.
3. Economical
The excellent performance and long life of zirconium targets make them highly cost-effective in long-term use.
4. Technological innovation
Our advantages
1. Competitive prices.
2. Our advantages are superior to other suppliers.
3. Same price, reliable quality.
4. Timely delivery according to your requirements.
5. Professional service, greatly reducing procurement costs.
Various parameters of zirconium sputtering targets
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Product Name
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Purity
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Density
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Processing Method
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Surface Condition
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HP
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ZrB2 Target
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3N
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Relative density：80% min.
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Company environment and customer visits
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