Zirconium Metal Sputtering Target

Zirconium Metal Sputtering Target

Material: Zr
Chemical composition: Zr
Melting point: 2128 K (1855C)
Boiling point: 4682 K (4409C)
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Description
Technical Parameters
Advantages of our zirconium sputtering targets

 

(1) Smooth surface without pores, scratches and other defects

(2) Ground or turned edges without cutting marks

(3) Unparalleled material purity

(4) High ductility

(5) Homogeneous microstructure

(6) Laser marking with your special product name, brand, purity size, etc.

(7) Every sputtering target, from powder material item and number, mixing workers, exhaust and HIP time, processing personnel to packaging details, is made by us.
All these steps can ensure that once a new sputtering target or method is created, it can be reproduced and saved to support stable product quality.

 

Our advantages

 

1. Competitive prices

2. Strong R&D team

3. Production process control management

4. Implementation of continuous improvement covering production, sales and customer service.

 

Our advantages

 

1. Competitive prices.

2. Our advantages are superior to other suppliers.

3. Same price, reliable quality.

4. Timely delivery according to your requirements.

5. Professional service, greatly reducing procurement costs.

 

Our Service

 

1. We will try our best to reply our customers' requests within 24 hours.

2. We will maintain effective and efficient communications with our customers.
3. We provide first-class quality control and after-sale services.

 

Related components of zirconium target

 

Chemical

R60702 (%) Max

Zr+Hf

≥99.2

Fe+Cr

0.2

Hf

4.5

C

0.050

N

0.025

H

0.005

O

0.16

 

Company environment and customer visits

Pure zr sputtering target company

 

pure Zirconium target company

We can provide you with free samples, manuals, laboratory test reports, industry reports, etc. Welcome to visit our factory and company.

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