Introduction to zirconium target
Zirconium target refers to zirconium metal target used in magnetron sputtering. It plays an important role in the preparation of high-tech thin films because of its excellent physical and chemical properties, such as high melting point, good corrosion resistance and low neutron absorption cross section. The application of zirconium target in magnetron sputtering can prepare high-quality zirconium thin films, which are widely used in microelectronics, optics, optoelectronics and other fields.
our service
1. Professional manufacturer--15 years of experience
2. Strict quality control - SGS inspection
3. High supply capacity--3000MT/month
4. Prompt delivery - within 15 days
We are your best and most assured choice
1. Professional and timely pre-sales consulting team
2. One-to-one sales support team
3. Professional manufacturing team
4. Butler-style after-sales service team
Mechanical parameters of zirconium target
|
Standard |
Material |
State |
Rm(≥)/MPa |
Rp0.2(Pa |
A50mm(≥)/% |
|
ASTM B550 |
R60702 |
annealed |
379 |
207 |
16 |
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