Niobium target is a target made of pure metal niobium, which is mainly used in material deposition, film growth and plasma enhanced deposition (PECVD) in the process of physical evaporation coating to improve the quality of the film and the uniformity of the film thickness. At the same time, niobium target can also be used in the manufacture of other electronic components and semiconductor devices.
Niobium target product pictures display
pure nb metal sputtering target
pure Niobium metal sputtering target